Heidenhain - Exposed Linear Encoder - LIP - LIF - LIC

Exposed linear encoders are designed for use on machines and installations that require high accuracy of the measured value.

Typical applications include:
  • Measuring and production equipment in the semiconductor industry
  • PCB assembly machines
  • Ultra-precision machines
  • High-accuracy machine tools
  • Measuring machines and comparators, measuring microscopes, and other precision measuring devices
  • Direct drives

 

LIP/LIF/LIC - For application in high and ultrahigh vacuum technology
Incremental Encoders

Our standard encoders are suitable for use in a low or medium vacuum. Encoders used for applications in a high or ultrahigh vacuum need to fulfill special requirements. Design and materials used have to be specially adapted for it. For more information, refer to the Technical Information document Linear Encoders for Vacuum Technology.
The following exposed linear encoders are specially adapted for use in high and ultrahigh vacuum environments.

  • High vacuum: LIP 481 V and LIF 481 V
  • High vacuum: LIC 4113 V and LIC 4193 V
  • Ultrahigh vacuum: LIP 481 U

 Model Baseline Error Substrate and mounting  Interpolation error Measuring length
  Accuracy grade Interval       
LIP 481V
LIP 481U

± 0.5µm 
± 1µm 

≤ ± 0.175 μm/ 5 mm Scale of Zerodur glass ceramic or glass with fixing clamps ± 7 nm 70 mm to 420 mm

LIF 481V

± 3 µm  ≤ ± 0.225 μm/ 5 mm Scale of Zerodur glass ceramic or glass with fixing clamps ± 12 nm 70 mm to 1020 mm
LIC 4113 V
LIC 4193 V
±1 µm (only for Robax glass ceramic), ±3 µm, ±5 µm ≤ ±0.275 µm/10 mm METALLUR scale grating on glass ceramic or glass ± 20 nm 240 mm to 3040 mm


 Exposed Linear Encoders - LIP/LIF/LIC PDF

 

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Heidenhain - Exposed Linear Encoders - LIP - LIF - LIC